• Ion Beam Milling System Leica EM TIC 3X Quick View
    • Ion Beam Milling System Leica EM TIC 3X Quick View
    • Ion Beam Milling System Leica EM TIC 3X

    • Ion Beam Milling technique, also known as Ion Beam Etching, is used to achieve a well-prepared sample surface quality for high resolution imaging and analysis. It removes residual artefacts from mechanical cutting and polishing. The ion polished cross-sections and planar samples prepared by Ion Beam Etching can be used for electron microscopy imaging as well as microstructural analysis applications such as EDS, WDS, Auger and EBSD. The Triple Ion Beam Milling System, Leica EM TIC 3X allows production of cross sections and planed surfaces for Scanning Electron Microscopy (SEM), Microstructure Analysis (EDS, WDS, Auger, EBSD) and, AFM investigations.
  • Leica EM RAPID Pharmaceutical Milling System Quick View
    • Leica EM RAPID Pharmaceutical Milling System Quick View
    • Leica EM RAPID Pharmaceutical Milling System

    • The Leica EM RAPID milling system for pharmaceutical research enables sample preparation for analysis of active ingredient distribution on solid-dose pharmaceuticals. The instrument, using a tungsten carbide or diamond miller, decapsulates pills without smearing and features adjustable cutting speeds between 300 and 20,000 rpm, defined step-layer removal, low-noise extraction and filtration with a Hepa filter and single or multiple holders.
  • Leica EM TRIM2 Quick View
    • Leica EM TRIM2 Quick View
    • Leica EM TRIM2

    • The Leica EM TRIM2 is a high speed milling system with integrated stereomicroscope and LED ring illuminator for trimming of biological and industrial samples prior to ultramicrotomy. The Leica TRIM2 features a 1µm feed control for the milling cutter, perpendicular viewing of the embedded sample to determine position for accurate milling, and a superior extraction system with Hepa filter.
  • Leica EM TXP Quick View
    • Leica EM TXP Quick View
    • Leica EM TXP

    • The Leica EM TXP is a target preparation device for milling, sawing, grinding, and polishing samples prior to examination by SEM, TEM, and LM techniques. An integrated stereomicroscope allows pinpointing and easy preparation of barely visible targets. With the specimen pivot arm the sample can be observed directly at an angle between 0° and 60°, or 90° to the front face for distance determination with an eyepiece graticule.
  • Low Vacuum Coater Leica EM ACE 200 Quick View
    • Low Vacuum Coater Leica EM ACE 200 Quick View
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    • Low Vacuum Coater Leica EM ACE 200

    • Leica EM ACE200 Low Vacuum Coater producing homogenous and conductive metal or carbon coatings for SEM and TEM analysis was never before more convenient than with the Leica EM ACE200 coating system. Configured as a sputter coater or carbon thread evaporation coater, perfectly reproducible results can be achieved  in the fully automated system. If both methods are required for your analysis Leica Microsystems offers a combined instrument with interchangeable heads in one instrument. Various options as Quartz Crystal Measurement, Planetary Rotation, Glow Discharge and Exchangeable Shielding complete this Low Vacuum Coater.
  • Sputter carbon and e beam coater Leica EM ACE 600 Quick View